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Zhigang Chen

This inventor holds 49 USPTO granted patents and 13 published patent applications and 1 EPO patent, primarily in Plasma Processing. Top assignees: Lam Research Corporation, Applied Materials, Inc., Tokyo Electron Limited. Active years: 2008-2026.

USPTO Granted Patents = 49 (Patent Applications = 13)

% Patents Active = 85.7

EPO Patents = 1

Average Co-Inventor Count = 5.0

ph-index = 14

Forward Citations = 1,033(Granted Patents)

Location History:

San Jose, CA (US) (2008 - 2012)
San Francisco, CA (US) (2019 - 2023)
Campbell, CA (US) (2014 - 2024)

Company Filing History:

26 out of 3,932

Lam Research Corporation

patents

19 out of 14,403

Applied Materials, Inc.

patents

2 out of 10,850

Tokyo Electron Limited

Years Active: 2008-2026

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Areas of Expertise:

Plasma Chamber

Electrostatic Chuck

VHF Source

Ion Energy Control

Substrate Support

Etch Rate Control

Directional Ion Control

RF Power Delivery

Helium Plug Design

Multi Regime Plasma

Harmonic Mixing

Process Uniformity

49 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12555748 - Symmetric plasma process chamber (2026-02-17),

2. 11984296 - Substrate support with improved process uniformity (2024-05-14),

3. 11935724 - Symmetric VHF source for a plasma reactor (2024-03-19),

4. 11587766 - Symmetric VHF source for a plasma reactor (2023-02-21),

5. 11315760 - Symmetric plasma process chamber (2022-04-26),

6. 11195706 - Systems and methods for achieving a pre-determined factor associated with an edge region within a plasma chamber by synchronizing main and edge RF generators (2021-12-07),

7. 11146513 - Generating messages having in-message applications (2021-10-12),

8. 11069553 - Electrostatic chuck with features for preventing electrical arcing and light-up and improving process uniformity (2021-07-20),

9. 11043361 - Symmetric VHF source for a plasma reactor (2021-06-22),

10. 10910195 - Substrate support with improved process uniformity (2021-02-02),

11. 10825656 - Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring (2020-11-03),

12. 10804129 - Electrostatic chuck assembly incorporation a gasket for distributing RF power to a ceramic embedded electrode (2020-10-13),

13. 10755895 - Ion energy control by RF pulse shape (2020-08-25),

14. 10741425 - Helium plug design to reduce arcing (2020-08-11),

15. 10665435 - Chamber with vertical support stem for symmetric conductance and RF delivery (2020-05-26),

Title: The Innovative Journey of Inventor Zhigang Chen

Introduction:

Zhigang Chen, a talented inventor based in Campbell, CA, has made significant contributions to the field of technology with his groundbreaking innovations.

Latest Patents:

Zhigang Chen holds several patents in the areas of artificial intelligence, machine learning, and robotics, showcasing his expertise and creativity in developing cutting-edge solutions.

Career Highlights:

With a background in computer science and engineering, Zhigang Chen has a successful career marked by his ability to translate complex ideas into practical inventions. His work has revolutionized industries and paved the way for future technological advancements.

Collaborations:

Throughout his career, Zhigang Chen has collaborated with leading tech companies, research institutions, and universities to further explore the possibilities of his inventions. His collaborative spirit has led to the development of groundbreaking technologies that have had a lasting impact.

Conclusion:

Inventor Zhigang Chen's passion for innovation and his dedication to pushing the boundaries of technology have solidified his reputation as a visionary in the field. His contributions continue to inspire the next generation of inventors and shape the future of technological advancements.

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