The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2015
Filed:
Aug. 27, 2012
Leonid Dorf, San Jose, CA (US);
Shahid Rauf, Pleasanton, CA (US);
Kenneth S. Collins, San Jose, CA (US);
Nipun Misra, San Jose, CA (US);
James D. Carducci, Sunnyvale, CA (US);
Gary Leray, Mountain View, CA (US);
Kartik Ramaswamy, San Jose, CA (US);
Leonid Dorf, San Jose, CA (US);
Shahid Rauf, Pleasanton, CA (US);
Kenneth S. Collins, San Jose, CA (US);
Nipun Misra, San Jose, CA (US);
James D. Carducci, Sunnyvale, CA (US);
Gary Leray, Mountain View, CA (US);
Kartik Ramaswamy, San Jose, CA (US);
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Abstract
A plasma reactor that generates plasma in workpiece processing chamber by a electron beam, has an electron beam source chamber and an array of plasma sources facing the electron beam source chamber for affecting plasma electron density in different portions of the processing chamber. In another embodiment, an array of separately controlled electron beam source chambers is provided.