Company Filing History:
Years Active: 2014-2023
Title: Innovations of Gary Leray
Introduction
Gary Leray is a prominent inventor based in Mountain View, CA (US), known for his significant contributions to the field of radio frequency (RF) technology. With a total of 15 patents to his name, Leray has made substantial advancements in methods and apparatuses that enhance the efficiency and functionality of RF power systems.
Latest Patents
Among his latest patents are "Methods and apparatus for common excitation of frequency generators" and "Methods and apparatus for supplying radio frequency (RF) power to a process chamber." The first patent describes an RF generator capable of operating with an RF power output that is independent of a reference frequency or can synchronize the RF output power to the reference frequency. This innovation utilizes a clock ramp to adjust the RF power output frequency to align with the reference frequency when they are not synchronized. Once the RF power output frequency matches the reference frequency, it can be locked to that frequency. The second patent, "Dual-level pulse tuning," outlines methods and apparatus for operating a plasma-enhanced substrate processing system using dual-level pulsed RF power. This technology allows for frequency and power tuning in a process chamber through a tuning controller connected to a matching network and/or an RF power generator.
Career Highlights
Gary Leray has built a successful career at Applied Materials, Inc., where he has been instrumental in developing cutting-edge RF technologies. His work has significantly impacted the efficiency of plasma processing systems, making them more adaptable and effective in various applications.
Collaborations
Throughout his career, Leray has collaborated with notable colleagues, including Valentin Nikolov Todorow and Shahid Rauf. These partnerships have fostered innovation and have contributed to the advancement of RF technology in the industry.
Conclusion
Gary Leray's contributions to RF technology through his patents and work at Applied Materials, Inc. highlight his role as a leading inventor in the field. His innovations continue to shape the future of radio frequency applications and enhance the capabilities of processing systems.
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