The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 17, 2015
Filed:
Jan. 27, 2014
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventor:
Gary Leray, Mountain View, CA (US);
Assignee:
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01R 31/40 (2014.01); H01J 37/32 (2006.01); G01R 19/00 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32082 (2013.01); H01J 37/3299 (2013.01); H01J 37/32146 (2013.01); H01J 37/32174 (2013.01); H01J 37/32935 (2013.01); G01R 19/0061 (2013.01);
Abstract
In a plasma reactor having pulsed RF plasma power sources, measurements by RF sensors of nulls attributable to pulse duty cycles are replaced by non-zero measurements synthesized from prior non-zero measurements, to prevent feedback control system instabilities.
Leray, Gary. (2015). Measurement of plural rf sensor devices in a pulsed rf plasma reactor (U.S. Patent No. 9190247). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9190247
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile