The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2014
Filed:
Aug. 05, 2013
Applied Materials, Inc., Santa Clara, CA (US);
Yang Yang, Sunnyvale, CA (US);
Kartik Ramaswamy, San Jose, CA (US);
Kenneth S. Collins, San Jose, CA (US);
Steven Lane, Porterville, CA (US);
Douglas A. Buchberger, Jr., Livermore, CA (US);
Lawrence Wong, Fremont, CA (US);
Nipun Misra, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method of controlling distribution of a plasma parameter in a plasma reactor having an RF-driven electrode and two (or more) counter electrodes opposite the RF driven electrode and facing different portions of the process zones. The method includes providing two (or more) variable reactances connected between respective ones of the counter electrodes and ground, and governing the variable reactances to change distribution of a plasma parameter such as plasma ion density or ion energy.