The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 13, 2016
Filed:
Feb. 10, 2014
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Leonid Dorf, San Jose, CA (US);
Shahid Rauf, Pleasanton, CA (US);
Kenneth S. Collins, San Jose, CA (US);
Nipun Misra, San Jose, CA (US);
Kartik Ramaswamy, San Jose, CA (US);
James D. Carducci, Sunnyvale, CA (US);
Steven Lane, Porterville, CA (US);
Assignee:
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3233 (2013.01);
Abstract
A plasma reactor that generates plasma in a workpiece processing chamber by an electron beam, has an electron beam source and segmented suppression electrode with individually biased segments to control electron beam density distribution.