Average Co-Inventor Count = 3.6

ph-index = 10

Forward Citations = 1,681(Granted Patents)

Company Filing History:

20 out of 3,715

Lsi Logic Corporation

Asml Netherlands B.v.

Avago Technologies General IP (singapore) Pte. Ltd.

patents

where one patent can have more than one assignee

Years Active: 1997-2015

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30 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 9188848 - Maskless vortex phase shift optical direct write lithography (2015-11-17),

2. 8377633 - Maskless vortex phase shift optical direct write lithography (2013-02-19),

3. 8057963 - Maskless vortex phase shift optical direct write lithography (2011-11-15),

4. 8012873 - Method for providing temperature uniformity of rapid thermal annealing (2011-09-06),

5. 7738078 - Optimized mirror design for optical direct write (2010-06-15),

6. 7634389 - Reflectivity optimization for multilayer stacks (2009-12-15),

7. 7499146 - Lithographic apparatus and device manufacturing method, an integrated circuit, a flat panel display, and a method of compensating for cupping (2009-03-03),

8. 7372547 - Process and apparatus for achieving single exposure pattern transfer using maskless optical direct write lithography (2008-05-13),

9. 7313508 - Process window compliant corrections of design layout (2007-12-25),

10. 7270942 - Optimized mirror design for optical direct write (2007-09-18),

11. 7264906 - OPC based illumination optimization with mask error constraints (2007-09-04),

12. 7189498 - Process and apparatus for generating a strong phase shift optical pattern for use in an optical direct write lithography process (2007-03-13),

13. 6809824 - Alignment process for integrated circuit structures on semiconductor substrate using scatterometry measurements of latent images in spaced apart test fields on substrate (2004-10-26),

14. 6759337 - Process for etching a controllable thickness of oxide on an integrated circuit structure on a semiconductor substrate using nitrogen plasma and plasma and an rf bias applied to the substrate (2004-07-06),

15. 6532585 - Method and apparatus for application of proximity correction with relative segmentation (2003-03-11),

Title: Innovator Spotlight: Nicholas K Eib - Pioneering Optical Direct Write Lithography

Introduction:

Nicholas K Eib, a talented inventor based in San Jose, CA, has made significant contributions to the field of optical direct write lithography. With an impressive portfolio of 30 patents, Eib's innovative work has revolutionized the way patterns are transferred onto substrates.

Latest Patents:

Eib's latest patents showcase his expertise in maskless vortex phase shift optical direct write lithography. These inventions involve methods and apparatus for generating vortex phase shift optical patterns using a mirror array, which are then directed onto a photosensitive layer of a substrate. The lithography methods and systems devised by Eib facilitate precise pattern transfer, enhancing the efficiency and accuracy of the process.

Career Highlights:

Having worked at renowned companies such as LSI Logic Corporation and LSI Corporation, Eib has honed his skills and expertise in the field of lithography. His dedication to innovation and problem-solving has enabled him to make significant advancements in optical direct write lithography, earning him recognition within the industry.

Collaborations:

Throughout his career, Eib has collaborated with esteemed professionals in the field, including coworkers such as Mario Garza and Keith K Chao. These collaborations have not only enriched Eib's own work but have also contributed to the collective knowledge and progress in the field of lithography.

Conclusion:

Nicholas K Eib's remarkable innovations in optical direct write lithography have established him as a leading figure in the industry. His commitment to excellence and continuous pursuit of technological advancement continue to inspire future generations of inventors and researchers in the field of lithography.

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