The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7634389 B1

PDF
Full Text
Expired
Date of Patent:
Dec. 15, 2009

Filed:

Nov. 21, 2003
Applicants:

Lav Ivanovic, Cupertino, CA (US);

Nicholas Eib, San Jose, CA (US);

Xudong Xu, San Jose, CA (US);

Inventors:

Lav Ivanovic, Cupertino, CA (US);

Nicholas Eib, San Jose, CA (US);

Xudong Xu, San Jose, CA (US);

Assignee:

LSI Corporation, Milpitas, CA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 7/60 (2006.01); H01L 21/00 (2006.01); H01L 21/469 (2006.01); G06F 19/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for obtaining an optimal reflectivity value for complex multilayer stacks is disclosed. Aspects of the present invention include generating a model of a multilayer stack and parameterizing each layer by a thickness and an index of refraction; allowing a user to input values for the parameters; calculating an extrema for a cost function of reflectivity R using the input parameter values; calculating sensitivity values S for the extrema points; and obtaining an optimal value by calculating a cost function R+S.


Find Patent Forward Citations

Loading…