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For the Inventor, By the Inventor

Austin, TX, United States of America

Nicholas A Stacey

This inventor holds 22 USPTO granted patents and 1 published patent application and 3 EPO patents, primarily in Imprint Lithography. Top assignees: Molecular Imprints, Inc., The University of Texas System, 3M Innovative Properties Company. Active years: 1992-2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nicholas A Stacey. Retrieved from https://idiyas.com/inventor/nicholas-a-stacey

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 22 

% Patents Active = 72.7

 

Average Co-Inventor Count = 3.6

ph-index = 15

Forward Citations = 636(Granted Patents)


Location History:

  • Saint Paul, MN (US) (1992)
  • Austin, TX (US) (2002 - 2013)

Company Filing History:

goldMedal14 out of 231 
 
Molecular Imprints, Inc.
 patents
silverMedal7 out of 5,638 
 
The University of Texas System
 patents
bronzeMedal6 out of 22,398 
 
3M Innovative Properties Company
 patents
where one patent can have more than one assignee

Years Active: 1992-2013

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Areas of Expertise:
Nanoimprint Lithography
Imprint Templates
Turbulent Flow
Polymerization Compositions
Etch Characteristics
Contact Printing
Fluid Flow Techniques
Photosensitization
Patterning Substrates
Transparent Support
Aqueous Acid Soluble Polymers
Liquid Crystal Polymers
22 patents (USPTO):Explore Patents
1. 8616873 - Micro-conformal templates for nanoimprint lithography (2013-12-31),
2. 8076386 - Materials for imprint lithography (2011-12-13),
3. 7939131 - Method to provide a layer with uniform etch characteristics (2011-05-10),
4. 7906060 - Compositions for dark-field polymerization and method of using the same for imprint lithography processes (2011-03-15),
5. 7906058 - Bifurcated contact printing technique (2011-03-15),
6. 7803308 - Technique for separating a mold from solidified imprinting material (2010-09-28),
7. 7547398 - Self-aligned process for fabricating imprint templates containing variously etched features (2009-06-16),
8. 7531025 - Method of creating a turbulent flow of fluid between a mold and a substrate (2009-05-12),
9. 7365103 - Compositions for dark-field polymerization and method of using the same for imprint lithography processes (2008-04-29),
10. 7282550 - Composition to provide a layer with uniform etch characteristics (2007-10-16),
11. 7270533 - System for creating a turbulent flow of fluid between a mold and a substrate (2007-09-18),
12. 7241395 - Reverse tone patterning on surfaces having planarity perturbations (2007-07-10),
13. 7205244 - Patterning substrates employing multi-film layers defining etch-differential interfaces (2007-04-17),
14. 7157036 - Method to reduce adhesion between a conformable region and a pattern of a mold (2007-01-02),
15. 7090716 - Single phase fluid imprint lithography method (2006-08-15),

Title: The Innovation Journey of Nicholas A Stacey: Pushing Boundaries in Nanoimprint Lithography

Introduction:

Nicholas A Stacey, a prolific inventor based in Austin, TX, has made significant contributions to the field of nanoimprint lithography. With a total of 21 patents to his name, Stacey's work has revolutionized the way we approach patterned layer formation and imprint lithography.

Latest Patents:

Stacey's latest patents showcase his expertise in the field, particularly focusing on micro-conformal templates for nanoimprint lithography. These templates, with unique backing layers and nanopatterned designs, allow for the creation of patterned layers with unparalleled precision. Additionally, his work on materials for imprint lithography highlights the importance of viscosity control and material composition in achieving optimal results.

Career Highlights:

Having worked at esteemed companies such as Molecular Imprints, Inc. and 3M Innovative Properties Company, Stacey has honed his skills and expertise in the realms of nanoimprint lithography and material science. His innovative approach to problem-solving and dedication to pushing boundaries have led to the successful implementation of cutting-edge technologies in the industry.

Collaborations:

Throughout his career, Stacey has collaborated with industry experts such as Frank Y Xu and Michael P C Watts. These collaborations have not only enriched his own knowledge and skills but have also contributed to the collective advancement of nanoimprint lithography techniques and materials.

Conclusion:

Nicholas A Stacey's journey as an inventor in the field of nanoimprint lithography is a testament to his passion for innovation and commitment to excellence. Through his groundbreaking patents and collaborations with industry leaders, Stacey continues to drive advancements in the industry and inspire future generations of inventors.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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