The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 15, 2006
Filed:
Oct. 02, 2003
Ian M. Mcmackin, Austin, TX (US);
Nicholas A. Stacey, Austin, TX (US);
Daniel A. Babbs, Austin, TX (US);
Duane J. Voth, Austin, TX (US);
Michael P. C. Watts, Austin, TX (US);
Van N. Truskett, Austin, TX (US);
Frank Y. Xu, Austin, TX (US);
Ronald D. Voisin, Austin, TX (US);
Pankaj B. Lad, Austin, TX (US);
Ian M. McMackin, Austin, TX (US);
Nicholas A. Stacey, Austin, TX (US);
Daniel A. Babbs, Austin, TX (US);
Duane J. Voth, Austin, TX (US);
Michael P. C. Watts, Austin, TX (US);
Van N. Truskett, Austin, TX (US);
Frank Y. Xu, Austin, TX (US);
Ronald D. Voisin, Austin, TX (US);
Pankaj B. Lad, Austin, TX (US);
Molecular Imprints, Inc., Austin, TX (US);
Board of Regents, The University of Texas System, Austin, TX (US);
Abstract
The present invention is directed toward a method for reducing pattern distortions in imprinting layers by reducing gas pockets present in a layer of viscous liquid deposited on a substrate. To that end, the method includes varying a transport of the gases disposed proximate to the viscous liquid. Specifically, the atmosphere proximate to the substrate wherein a pattern is to be recorded is saturated with gases that are either highly soluble, highly diffusive, or both with respect to the viscous liquid being deposited. Additionally, or in lieu of saturating the atmosphere, the pressure of the atmosphere may be reduced.