The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 10, 2011

Filed:

Aug. 16, 2004
Applicants:

Frank Y. Xu, Round Rock, TX (US);

Christopher J. Mackay, Austin, TX (US);

Pankaj B. Lad, Austin, TX (US);

Ian M. Mcmackin, Austin, TX (US);

Van N. Truskett, Austin, TX (US);

Wesley D. Martin, Austin, TX (US);

Edward B. Fletcher, Austin, TX (US);

David C. Wang, Austin, TX (US);

Nicholas A. Stacey, Austin, TX (US);

Michael P. C. Watts, Austin, TX (US);

Inventors:

Frank Y. Xu, Round Rock, TX (US);

Christopher J. Mackay, Austin, TX (US);

Pankaj B. Lad, Austin, TX (US);

Ian M. McMackin, Austin, TX (US);

Van N. Truskett, Austin, TX (US);

Wesley D. Martin, Austin, TX (US);

Edward B. Fletcher, Austin, TX (US);

David C. Wang, Austin, TX (US);

Nicholas A. Stacey, Austin, TX (US);

Michael P. C. Watts, Austin, TX (US);

Assignee:

Molecular Imprints, Inc., Austin, TX (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D 3/12 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention includes a method and a composition to form a layer on a substrate having uniform etch characteristics. To that end, the method includes controlling variations in the characteristics of a solid layer, such etch characteristics over the area of the solid layer as a function of the relative rates of evaporation of the liquid components that comprise the composition from which the solid layer is formed.


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