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For the Inventor, By the Inventor

Toyama, Japan

Naofumi Ohashi

This inventor holds 104 USPTO granted patents and 48 published patent applications, primarily in Semiconductor Manufacturing (CPC class C23C16-52). Top assignees: Kokusai Electric Corporation, Hitachi-Kokusai Electric Inc., Renesas Technology Corp.. Active years: 2001-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Naofumi Ohashi. Retrieved from https://idiyas.com/inventor/naofumi-ohashi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 104 

% Patents Active = 92.3

Average Co-Inventor Count = 3.2

ph-index = 9

Forward Citations = 461(Granted Patents)

Forward Citations (Not Self Cited) = 423(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Hanno, JP (2001 - 2005)
  • Tsukuba, JP (2005 - 2006)
  • Tokyo, JP (2006 - 2011)
  • Hannou, JP (2001 - 2012)
  • Toyama, JP (2015 - 2024)

Company Filing History:

goldMedal59 out of 697 
 
Kokusai Electric Corporation
 patents
silverMedal17 out of 1,258 
 
Hitachi-Kokusai Electric Inc.
 patents
bronzeMedal13 out of 3,781 
 
Renesas Technology Corp.
 patents
4. 10 out of 42,731 
 
Hitachi, Ltd.
 patents
5. 2 out of 8,782 
 
Sanyo Electric Co., Ltd.
 patents
6. 1 out of 1 
 
Hiatchi Kokusai Electric, Inc.
 patent
7. 1 out of 7,654 
 
Renesas Electronics Corporation
 patents
8. 1 out of 58,145 
 
Sony Corporation
 patents

Years Active: 2001-2026

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Areas of Expertise:
Substrate Processing
Semiconductor Device
Manufacturing Method
Processing Apparatus
Recording Medium
Exhaust System Cleaning
Non-Transitory Computer-Readable
Process Chamber Maintenance
3D Stacking
Thermal Management
TSV Interconnects
104 patents (USPTO):Explore Patents
1. 12740361 - Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium (2026-09-15),
2. 12622212 - Substrate processing apparatus, method of manufacturing semiconductor device, and non-transitory computer-readable recording medium (2026-05-05),
3. 12581902 - Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium (2026-03-17),
4. 12581882 - Substrate processing method, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium (2026-03-17),
5. 12567571 - Method of manufacturing semiconductor device (2026-03-03),
6. 12424409 - Substrate processing apparatus, substrate processing method, method of manufacturing semiconductor device, and non-transitory computer-readable recording medium (2025-09-23),
7. 12392032 - Substrate processing apparatus with cleaning of exhaust system (2025-08-19),
8. 12387949 - Substrate processing apparatus (2025-08-12),
9. 12327755 - Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium (2025-06-10),
10. 12327720 - Method of processing substrate, substrate processing apparatus, recording medium, and manufacturing semiconductor device (2025-06-10),
11. 12320778 - Method of processing substrate, substrate processing apparatus, method of manufacturing semiconductor processing apparatus, and recording medium (2025-06-03),
12. 12224185 - Method of manufacturing semiconductor device (2025-02-11),
13. 12165894 - Processing method, method of manufacturing semiconductor, and substrate processing apparatus (2024-12-10),
14. 12131902 - Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium (2024-10-29),
15. 12106998 - Substrate processing apparatus, substrate processing method, non-transitory computer-readable recording medium and method of manufacturing semiconductor device (2024-10-01),

Title: Naofumi Ohashi: Pioneering Inventor from Toyama

Introduction: Naofumi Ohashi is a distinguished inventor hailing from Toyama, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Naofumi Ohashi holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his commitment to pushing the boundaries of technological advancement.

Career Highlights: With a career spanning over two decades, Naofumi Ohashi has worked with leading tech companies and research institutions, playing a pivotal role in the development of cutting-edge solutions that have revolutionized various industries.

Collaborations: Throughout his career, Naofumi Ohashi has collaborated with top engineers, scientists, and researchers from around the world, fostering a culture of innovation and knowledge sharing that has led to numerous breakthrough inventions.

Conclusion: Naofumi Ohashi's relentless pursuit of innovation and his passion for creating transformative technologies have solidified his reputation as a visionary inventor, inspiring the next generation of innovators to push the boundaries of what is possible in the world of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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