Toyama, Japan

Naofumi Ohashi

USPTO Granted Patents = 99 

Average Co-Inventor Count = 3.3

ph-index = 9

Forward Citations = 452(Granted Patents)

Forward Citations (Not Self Cited) = 423(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Hanno, JP (2001 - 2005)
  • Tsukuba, JP (2005 - 2006)
  • Tokyo, JP (2006 - 2011)
  • Hannou, JP (2001 - 2012)
  • Toyama, JP (2015 - 2024)

Company Filing History:


Years Active: 2001-2025

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Areas of Expertise:
Substrate Processing Apparatus
Semiconductor Device Manufacturing
Non-Transitory Computer-Readable Medium
Exhaust System Cleaning
Process Chamber Maintenance
Lithography Template Manufacturing
Gas Supply Method
Semiconductor Processing Method
99 patents (USPTO):Explore Patents

Title: Naofumi Ohashi: Pioneering Inventor from Toyama

Introduction: Naofumi Ohashi is a distinguished inventor hailing from Toyama, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Naofumi Ohashi holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his commitment to pushing the boundaries of technological advancement.

Career Highlights: With a career spanning over two decades, Naofumi Ohashi has worked with leading tech companies and research institutions, playing a pivotal role in the development of cutting-edge solutions that have revolutionized various industries.

Collaborations: Throughout his career, Naofumi Ohashi has collaborated with top engineers, scientists, and researchers from around the world, fostering a culture of innovation and knowledge sharing that has led to numerous breakthrough inventions.

Conclusion: Naofumi Ohashi's relentless pursuit of innovation and his passion for creating transformative technologies have solidified his reputation as a visionary inventor, inspiring the next generation of innovators to push the boundaries of what is possible in the world of technology.

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