The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 12, 2025

Filed:

Mar. 21, 2024
Applicant:

Kokusai Electric Corporation, Tokyo, JP;

Inventors:

Teruo Yoshino, Toyama, JP;

Naofumi Ohashi, Toyama, JP;

Tadashi Takasaki, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); F27B 17/00 (2006.01); F27D 3/00 (2006.01); F27D 9/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67196 (2013.01); F27B 17/0025 (2013.01); F27D 3/0084 (2013.01); H01L 21/67103 (2013.01); H01L 21/67167 (2013.01); H01L 21/67201 (2013.01); H01L 21/67242 (2013.01); F27D 2009/0013 (2013.01);
Abstract

Described herein is a technique capable of reducing an amount of moisture in a low temperature region in a substrate processing apparatus provided with a transfer chamber. According to one aspect of the technique, there is provided a substrate processing apparatus including: a process chamber provided with a heater; a load lock chamber; a transfer chamber provided between the process chamber and the load lock chamber and including a first region provided adjacent to the process chamber and a second region provided more adjacent to the load lock chamber than the first region and whose temperature is lower than a temperature of the first region; a detector capable of detecting an amount of moisture in the transfer chamber; and an inert gas supplier capable of supplying an inert gas toward the second region in the transfer chamber.


Find Patent Forward Citations

Loading…