Naein Lee

This inventor holds 25 USPTO granted patents and 4 published patent applications, primarily in Semiconductor Fabrication. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2014-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Naein Lee. Retrieved from https://idiyas.com/inventor/naein-lee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

USPTO Granted Patents = 25 (Patent Applications = 4)

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 4

Forward Citations = 53(Granted Patents)

Location History:

Hwasung, KR (2018)
Seoul, KR (2014 - 2019)

Company Filing History:

25 out of 132,108

Samsung Electronics Co., Ltd.

patents

Years Active: 2014-2019

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Areas of Expertise:

Semiconductor Devices

Fabrication Methods

Air Gap Isolation

Multilayer Structures

Dielectric Layers

Etch Stop Layers

Transistor Manufacturing

Porous Dielectric Treatment

Through-Electrodes

Stressors

Electrolyzed Sulfuric Acid

25 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10497647 - Semiconductor devices and methods of fabricating the same (2019-12-03),

2. 10438802 - Method of fabricating a semiconductor device (2019-10-08),

3. 10199325 - Semiconductor device and method of fabricating the same (2019-02-05),

4. 10192782 - Method of manufacturing semiconductor device using a plurality of etch stop layers (2019-01-29),

5. 10186485 - Planarized interlayer dielectric with air gap isolation (2019-01-22),

6. 10141258 - Semiconductor devices having staggered air gaps (2018-11-27),

7. 10109665 - Semiconductor device and method of fabricating the same (2018-10-23),

8. 10049997 - Semiconductor device and method of fabricating the same (2018-08-14),

9. 9972528 - Semiconductor devices (2018-05-15),

10. 9953827 - Method of forming semiconductor device having dielectric layer and related system (2018-04-24),

11. 9929099 - Planarized interlayer dielectric with air gap isolation (2018-03-27),

12. 9911644 - Semiconductor devices and methods of fabricating the same (2018-03-06),

13. 9842803 - Semiconductor devices including gaps between conductive patterns (2017-12-12),

14. 9748170 - Semiconductor devices having staggered air gaps (2017-08-29),

15. 9576848 - Method of treating a porous dielectric layer and a method of fabricating a semiconductor device using the same (2017-02-21),

Title: Inventor Naein Lee: Revolutionizing Technology in Seoul

Introduction: Naein Lee is a pioneering inventor based in Seoul, South Korea, known for his groundbreaking contributions to the field of technology.

Latest Patents: Lee holds several patents in the areas of artificial intelligence, robotics, and renewable energy technologies, showcasing his innovative spirit and forward-thinking approach.

Career Highlights: With a career spanning over two decades, Naein Lee has worked with top research institutions and leading tech companies to develop cutting-edge solutions that have reshaped the industry.

Collaborations: Throughout his career, Lee has collaborated with renowned scientists, engineers, and inventors from around the world, fostering a culture of innovation and knowledge exchange.

Conclusion: Naein Lee's passion for innovation and his relentless pursuit of technological advancement continue to inspire the next generation of inventors and shape the future of technology in Seoul and beyond.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

4 patents pending: