Naein Lee

This inventor holds 25 USPTO granted patents and 4 published patent applications, primarily in Semiconductor Fabrication. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2014-2019.

USPTO Granted Patents = 25 (Patent Applications = 4)

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 4

Forward Citations = 53(Granted Patents)

Location History:

Hwasung, KR (2018)
Seoul, KR (2014 - 2019)

Company Filing History:

25 out of 132,108

Samsung Electronics Co., Ltd.

patents

Years Active: 2014-2019

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Areas of Expertise:

Semiconductor Devices

Fabrication Methods

Air Gap Isolation

Multilayer Structures

Dielectric Layers

Etch Stop Layers

Transistor Manufacturing

Porous Dielectric Treatment

Through-Electrodes

Stressors

Electrolyzed Sulfuric Acid

25 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10497647 - Semiconductor devices and methods of fabricating the same (2019-12-03),

2. 10438802 - Method of fabricating a semiconductor device (2019-10-08),

3. 10199325 - Semiconductor device and method of fabricating the same (2019-02-05),

4. 10192782 - Method of manufacturing semiconductor device using a plurality of etch stop layers (2019-01-29),

5. 10186485 - Planarized interlayer dielectric with air gap isolation (2019-01-22),

6. 10141258 - Semiconductor devices having staggered air gaps (2018-11-27),

7. 10109665 - Semiconductor device and method of fabricating the same (2018-10-23),

8. 10049997 - Semiconductor device and method of fabricating the same (2018-08-14),

9. 9972528 - Semiconductor devices (2018-05-15),

10. 9953827 - Method of forming semiconductor device having dielectric layer and related system (2018-04-24),

11. 9929099 - Planarized interlayer dielectric with air gap isolation (2018-03-27),

12. 9911644 - Semiconductor devices and methods of fabricating the same (2018-03-06),

13. 9842803 - Semiconductor devices including gaps between conductive patterns (2017-12-12),

14. 9748170 - Semiconductor devices having staggered air gaps (2017-08-29),

15. 9576848 - Method of treating a porous dielectric layer and a method of fabricating a semiconductor device using the same (2017-02-21),

Title: Inventor Naein Lee: Revolutionizing Technology in Seoul

Introduction: Naein Lee is a pioneering inventor based in Seoul, South Korea, known for his groundbreaking contributions to the field of technology.

Latest Patents: Lee holds several patents in the areas of artificial intelligence, robotics, and renewable energy technologies, showcasing his innovative spirit and forward-thinking approach.

Career Highlights: With a career spanning over two decades, Naein Lee has worked with top research institutions and leading tech companies to develop cutting-edge solutions that have reshaped the industry.

Collaborations: Throughout his career, Lee has collaborated with renowned scientists, engineers, and inventors from around the world, fostering a culture of innovation and knowledge exchange.

Conclusion: Naein Lee's passion for innovation and his relentless pursuit of technological advancement continue to inspire the next generation of inventors and shape the future of technology in Seoul and beyond.