Tokyo, Japan

Motosuke Miyoshi

This inventor holds 48 USPTO granted patents, primarily in Electron Beam Technology. Top assignees: Kabushiki Kaisha Toshiba, Tokyo Shibaura Denki Kabushiki Kaisha, The University of Tokyo. Active years: 1985-2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Motosuke Miyoshi. Retrieved from https://idiyas.com/inventor/motosuke-miyoshi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 89.6

Average Co-Inventor Count = 2.9

ph-index = 19

Forward Citations = 1,130(Granted Patents)


Location History:

  • Fujisawa, JP (1985 - 1991)
  • Minato, JP (1994 - 1995)
  • Minato-ku, JP (1997 - 2001)
  • Tokyo-Tu, JP (2003)
  • Tokyo-To, JP (1996 - 2004)
  • Tokyo, JP (1989 - 2010)

Company Filing History:


Years Active: 1985-2010

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Areas of Expertise:
Substrate Inspection
Electron Beam
Semiconductor Manufacturing
Charged Particle Beam
Lithography
Pattern Measurement
Defect Detection
Optical Lens
Plasma Processing
Thickness Measurement
X-ray Source
48 patents (USPTO):Explore Patents

Title: Motosuke Miyoshi: Innovator in Semiconductor Inspection Technology

Introduction: Motosuke Miyoshi is a prominent inventor based in Tokyo, Japan, known for his extensive contributions to the field of semiconductor technology. With an impressive portfolio of 48 patents, Miyoshi has established himself as a key player in developing innovative solutions that enhance substrate inspection methods and manufacturing processes for semiconductor devices.

Latest Patents: Among his most recent patents, Miyoshi has developed a substrate inspection apparatus that employs an electron beam irradiation device to inspect substrates. This apparatus utilizes an electron beam detector to capture secondary, reflected, and backscattered electrons from the substrate, forming detailed one-dimensional and two-dimensional images of its surface. Additionally, he has patented a method involving an electromagnetic wave irradiation device that enhances the precision of the inspection process. Another notable invention includes an X-ray source that operates within a vacuum container, utilizing an electro-optical system to reduce color aberration and concurrently minimize focus size.

Career Highlights: Throughout his career, Motosuke Miyoshi has worked for major companies, including Toshiba Corporation and Tokyo Shibaura Electric Co., Ltd. His work in these organizations has enabled him to drive technological advancements in the semiconductor industry, focusing on improving inspection techniques crucial for quality assurance in manufacturing.

Collaborations: Miyoshi has collaborated with fellow experts in the field, notably Yuichiro Yamazaki and Katsuya Okumura. These partnerships have fostered innovation and contributed to the successful development of sophisticated semiconductor technologies.

Conclusion: Motosuke Miyoshi’s groundbreaking inventions and patents stand as a testament to his expertise and commitment to advancing semiconductor inspection technology. His innovative approaches continue to influence the industry, paving the way for more efficient and effective manufacturing processes. With a wealth of knowledge and experience, Miyoshi remains a significant figure in the realm of technological innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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