The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 2010
Filed:
Nov. 05, 2008
Ichirota Nagahama, Ibaraki, JP;
Yuichiro Yamazaki, Tokyo, JP;
Takamitsu Nagai, Kanagawa, JP;
Motosuke Miyoshi, Tokyo, JP;
Ichirota Nagahama, Ibaraki, JP;
Yuichiro Yamazaki, Tokyo, JP;
Takamitsu Nagai, Kanagawa, JP;
Motosuke Miyoshi, Tokyo, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A substrate inspection apparatus includes: an electron beam irradiation device which emits an electron beam and causes the electron beam to irradiate a substrate to be inspected as a primary beam; an electron beam detector which detects at least one of a secondary electron, a reflected electron and a backscattered electron that are generated from the substrate that has been irradiated by the electron beam, and which outputs a signal that forms a one-dimensional or two-dimensional image of a surface of the substrate; a mapping projection optical system which causes imaging of at least one of the secondary electron, the reflected electron and the backscattered electron on the electron beam detector as a secondary beam; and an electromagnetic wave irradiation device which generates an electromagnetic wave and causes the electromagnetic wave to irradiate a location on the surface of the substrate at which the secondary beam is generated.