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For the Inventor, By the Inventor

Ibaraki, Japan

Ichirota Nagahama

USPTO Granted Patents = 30

 

Average Co-Inventor Count = 4.4

ph-index = 9

Forward Citations = 390(Granted Patents)


Location History:

  • Ibaraki-ken, JP (2007 - 2008)
  • Ibaraki, JP (2005 - 2010)
  • Tokyo, JP (2011)
  • Koga, JP (2008 - 2013)
  • Kanagawa, JP (2007 - 2014)
  • Yokohama, JP (2003 - 2016)

Company Filing History:

goldMedal29 out of 52,711 
 
Kabushiki Kaisha Toshiba
 patents
silverMedal19 out of 2,508 
 
Ebara Corporation
 patents
where one patent can have more than one assignee

Years Active: 2003-2016

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30 patents (USPTO):
1. 9368314 - Inspection system by charged particle beam and method of manufacturing devices using the system (2016-06-14),
2. 8803103 - Inspection system by charged particle beam and method of manufacturing devices using the system (2014-08-12),
3. 8611638 - Pattern inspection method and pattern inspection apparatus (2013-12-17),
4. 8368031 - Inspection system by charged particle beam and method of manufacturing devices using the system (2013-02-05),
5. 8124933 - Mapping-projection-type electron beam apparatus for inspecting sample by using electrons emitted from the sample (2012-02-28),
6. 8067732 - Electron beam apparatus (2011-11-29),
7. 8053726 - Inspection system by charged particle beam and method of manufacturing devices using the system (2011-11-08),
8. 8035082 - Projection electron beam apparatus and defect inspection system using the apparatus (2011-10-11),
9. 7863580 - Electron beam apparatus and an aberration correction optical apparatus (2011-01-04),
10. 7847250 - Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor device (2010-12-07),
11. 7838831 - Substrate inspection apparatus, substrate inspection method and semiconductor device manufacturing method (2010-11-23),
12. 7674570 - Mask pattern inspection method, exposure condition verification method, and manufacturing method of semiconductor device (2010-03-09),
13. 7645988 - Substrate inspection method, method of manufacturing semiconductor device, and substrate inspection apparatus (2010-01-12),
14. 7608821 - Substrate inspection apparatus, substrate inspection method and semiconductor device manufacturing method (2009-10-27),
15. 7592586 - Mapping-projection-type electron beam apparatus for inspecting sample by using electrons reflected from the sample (2009-09-22),

Title: The Innovative Journey of Ichirota Nagahama

Introduction: Ichirota Nagahama is a renowned inventor hailing from Ibaraki, Japan, known for his groundbreaking contributions to various fields through his inventive spirit and dedication to innovation.

Latest Patents: Nagahama's latest patents include advancements in sustainable energy solutions, medical device technologies, and cutting-edge materials science, showcasing his versatility and forward-thinking approach to invention.

Career Highlights: With a career spanning over two decades, Nagahama has established himself as a pioneer in the field of robotics, with several patents related to AI and automation. His work in the healthcare sector has also led to significant advancements in medical imaging and diagnostic tools.

Collaborations: Throughout his career, Nagahama has collaborated with leading research institutions, universities, and tech companies to bring his inventions to life. His collaborative efforts have resulted in the development of innovative products that have had a lasting impact on various industries.

Conclusion: Ichirota Nagahama's passion for innovation and his relentless pursuit of excellence have solidified his reputation as a visionary inventor. His contributions to the world of technology and science continue to inspire future generations of inventors and innovators.

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