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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9368314 B1

PDFFull Text
Date of Patent:
Jun. 14, 2016

Filed:

Jun. 30, 2014

Inspection system by charged particle beam and method of manufacturing devices using the system

Applicant:

Ebara Corporation, Tokyo, JP;

Inventors:

Mamoru Nakasuji, Yokohama, JP;

Nobuharu Noji, Zushi, JP;

Tohru Satake, Chigasaki, JP;

Masahiro Hatakeyama, Fujisawa, JP;

Toshifumi Kimba, Fujisawa, JP;

Hirosi Sobukawa, Zama, JP;

Shoji Yoshikawa, Hachioji, JP;

Takeshi Murakami, Shinagawa-ku, JP;

Kenji Watanabe, Fujisawa, JP;

Tsutomu Karimata, Yokohama, JP;

Shin Oowada, Yokohama, JP;

Mutsumi Saito, Yokohama, JP;

Yuichiro Yamazaki, Tokyo, JP;

Takamitsu Nagai, Yokohama, JP;

Ichirota Nagahama, Yokohama, JP;

Assignee:

EBARA CORPORATION, Tokyo, JP;

Attorney:

Westerman, Hattori, Daniels & Adrian, LLP

Primary Examiner:

Andrew Smyth

Int. Cl.
CPC ...
G01N 23/225 (2006.01); H01J 29/70 (2006.01); H01J 37/06 (2006.01); H01J 37/073 (2006.01); H01J 37/18 (2006.01); H01J 37/20 (2006.01); H01J 37/22 (2006.01); H01J 37/244 (2006.01); H01J 37/28 (2006.01); H01L 21/67 (2006.01); G01N 23/227 (2006.01); H01J 37/26 (2006.01); H01J 37/141 (2006.01);
U.S. Cl.
CPC ...
H01J 29/70 (2013.01); G01N 23/225 (2013.01); G01N 23/227 (2013.01); G01N 23/2251 (2013.01); H01J 37/06 (2013.01); H01J 37/073 (2013.01); H01J 37/185 (2013.01); H01J 37/20 (2013.01); H01J 37/222 (2013.01); H01J 37/244 (2013.01); H01J 37/266 (2013.01); H01J 37/28 (2013.01); H01L 21/6719 (2013.01); H01L 21/67213 (2013.01); H01J 37/141 (2013.01); H01J 2237/082 (2013.01); H01J 2237/202 (2013.01); H01J 2237/204 (2013.01); H01J 2237/20228 (2013.01); H01J 2237/22 (2013.01); H01J 2237/24564 (2013.01); H01J 2237/2806 (2013.01); H01J 2237/2816 (2013.01); H01J 2237/2817 (2013.01);
Abstract

An inspection apparatus by an electron beam comprises: an electron-optical devicehaving an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical systems; a stage systemfor holding and moving the object relative to the electron-optical system; a mini-environment chamberfor supplying a clean gas to the object to prevent dust from contacting the object; a working chamberfor accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambersdisposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loaderfor transferring the object to the stage system through the loading chambers.

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