Kanagawa, Japan

Hirosi Sobukawa

This inventor holds 45 USPTO granted patents and 1 published patent application and 1 EPO patent, primarily in Electron Beam Inspection. Top assignees: Ebara Corporation, Kabushiki Kaisha Toshiba, Nikon Corporation. Active years: 2001-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hirosi Sobukawa. Retrieved from https://idiyas.com/inventor/hirosi-sobukawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 45 

% Patents Active = 40.0

 

Average Co-Inventor Count = 9.6

ph-index = 17

Forward Citations = 953(Granted Patents)


Location History:

  • Isehara, JP (2008)
  • Kanagawa, JP (2003 - 2014)
  • Ohta-ku, JP (2013 - 2014)
  • Kanagawa-ken, JP (2001 - 2016)
  • Zama, JP (2008 - 2016)
  • Tokyo, JP (2011 - 2016)

Company Filing History:


Years Active: 2001-2016

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Areas of Expertise:
Electron Beam
Charged Particle
Inspection System
Device Manufacturing
Semiconductor
Testing Apparatus
Surface Inspection
Aberration Correction
Objective Lens
Sheet Beam
Defect Inspection
Device Fabrication
45 patents (USPTO):Explore Patents

Title: Hirosi Sobukawa: A Pioneer in Electron Beam Innovations

Introduction

Hirosi Sobukawa, based in Kanagawa, Japan, is a distinguished inventor with a remarkable portfolio of 45 patents. His innovative contributions to the field of electron beam technology have significantly advanced methods in device manufacturing and inspection processes.

Latest Patents

Among Sobukawa's latest inventions is a testing apparatus utilizing charged particles. This apparatus involves irradiating a substrate with primary electrons. The secondary electrons generated from the substrate are subsequently detected, enabling a detailed analysis of electronic components. The technology incorporates a reference die to obtain a pattern matching template image. This image aids in conducting pattern matching with various dies to calculate misalignment angles. The invention’s remarkable feature is its capability to rotate the stage, correcting misalignments to optimize manufacturing processes.

Another of his innovative patents includes an electro-optical inspection apparatus that employs an electron beam. This system captures images by directing a primary electron beam to various sub-visual fields on a sample surface. The detection of secondary electrons provides invaluable information about the sample's properties. This apparatus features unit detectors with advanced optical fibers and scintillators to enhance the precision of the inspection process.

Career Highlights

Hirosi Sobukawa has made substantial contributions to prominent companies such as Ebara Corporation and Toshiba Corporation. His work has been integral to developing cutting-edge technologies in the electronics sector, particularly focused on enhancing manufacturing and inspection techniques.

Collaborations

Throughout his career, Sobukawa has collaborated with notable professionals, including Nobuharu Noji and Tohru Satake. These partnerships have led to groundbreaking advancements and innovations that continue to shape the industry.

Conclusion

Hirosi Sobukawa stands out as a leading figure in the field of electron beam technology, contributing significantly through his numerous patents. His innovative spirit and collaborations with fellow experts underscore the impact of his work in enhancing manufacturing and inspection processes within the electronics industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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