The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 2003
Filed:
Jul. 24, 2000
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Abstract
An electron beam lithography system comprises an electron gun including a rectangular cathode having an emission surface having an aspect ratio of other than 1, an illumination optical system of an asymmetric lens system including multipole lenses Qa and Qa , a CP aperture , and a projection optical system of a symmetric lens system including multipole lenses Qb through Qb . This electron beam lithography system is used for emitting an electron beam at a low acceleration of 5 kV or less from the rectangular cathode , for controlling the illumination optical system so as to form an image of a desired character of the CP aperture on an isotropic plane of incidence at different demagnifications in minor-axis and major-axis directions in accordance with the aspect ratio of the rectangular cathode , and for controlling the projection optical system so that the electron beam leaving the CP aperture as an aperture image is incident on a substrate at the same demagnification in the minor-axis and major-axis directions and at different incident angles in the minor-axis and major-axis directions while passing through the trajectory without establishing any crossovers.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile