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For the Inventor, By the Inventor

Gwangmyeong, South Korea

Moon-Gyu Jeong

This inventor holds 11 USPTO granted patents. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2013-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Moon-Gyu Jeong. Retrieved from https://idiyas.com/inventor/moon-gyu-jeong

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 11

% Patents Active = 81.8

Average Co-Inventor Count = 1.4

ph-index = 3

Forward Citations = 19(Granted Patents)


Company Filing History:

goldMedal11 out of 132,108 
 
Samsung Electronics Co., Ltd.
 patents

Years Active: 2013-2024

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11 patents (USPTO):Explore Patents
1. 12111567 - Method for performing optical proximity correction and method of manufacturing a mask using optical proximity correction (2024-10-08),
2. 10527929 - Methods of improving optical proximity correction models and methods of fabricating semiconductor devices using the same (2020-01-07),
3. 10386713 - Method of providing initial bias value for optical proximity correction, and mask fabricating method with optical proximity correction based on the initial bias value (2019-08-20),
4. 10255397 - Methods of rasterizing mask layout and methods of fabricating photomask using the same (2019-04-09),
5. 10222690 - Method of optimizing a mask using pixel-based learning and method for manufacturing a semiconductor device using an optimized mask (2019-03-05),
6. 9952499 - Method of fabricating a mask using common bias values in optical proximity correction (2018-04-24),
7. 9311439 - Methods of patterning wafers using self-aligned double patterning processes (2016-04-12),
8. 9129352 - Optical proximity correction modeling method and system (2015-09-08),
9. 8694927 - Method of designing pattern layouts (2014-04-08),
10. 8677288 - Test pattern selection method for OPC model calibration (2014-03-18),
11. 8510684 - Method of forming a photomask layout using optical proximity correction to compensate for a three-dimensional mask effect (2013-08-13),

Title: **Moon-Gyu Jeong: Pioneer in Optical Proximity Correction**

Introduction

Moon-Gyu Jeong, an accomplished inventor based in Gwangmyeong-si, South Korea, has made significant contributions to the field of optical proximity correction. With a remarkable portfolio of 11 patents, his advancements have paved the way for improved manufacturing processes in the semiconductor industry.

Latest Patents

Among his latest patents are two notable inventions: the "Method for performing optical proximity correction" and the "Method of manufacturing a mask using optical proximity correction." The former focuses on enhancing the accuracy of mask images by efficiently reflecting the effects of mask topography or the coupling effects between pattern edges. The OPC method involves extracting edges from a mask layout, identifying edge pairs, generating coupling edges, and employing filters to refine mask images. The latter patent details a semiconductor fabrication process that incorporates an OPC model for correcting layouts before the creation of photomasks and substrate patterns.

Career Highlights

Moon-Gyu Jeong has made significant strides during his tenure at Samsung Electronics Co., Ltd., where he has applied his expertise in optical proximity correction to enhance semiconductor device manufacturing. His innovative approaches have led to the successful implementation of correction techniques that have garnered recognition in the industry.

Collaborations

Throughout his career, Moon-Gyu Jeong has collaborated with talented colleagues, including Dmitry Vengertsev and Seong-Ho Moon. Their collective efforts contribute to driving innovation and the advancement of technology within their field.

Conclusion

With his extensive patent portfolio and ongoing contributions to semiconductor manufacturing, Moon-Gyu Jeong stands as a leading figure in optical proximity correction. His work not only showcases his ingenuity as an inventor but also emphasizes the vital role innovation plays in the ever-evolving landscape of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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