The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 08, 2024
Filed:
Apr. 19, 2019
Samsung Electronics Co., Ltd., Suwon-si, KR;
Na-rak Choi, Yongin-si, KR;
Moon-gyu Jeong, Gwangmyeong-si, KR;
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
Abstract
Provided are a method for performing optical proximity correction (OPC) of improving an accuracy of a mask image by reflecting efficiently a mask topography effect or a coupling effect between edges of a pattern, and a method of manufacturing a mask by using OPC. The method for performing OPC includes: extracting edges for a layout of a pattern on a mask; extracting edge pairs in which widths between adjacent edges among the edges are equal to or less than a certain distance; generating a coupling edge for each of the edge pairs; generating a first mask image by applying an edge filter to the edges; and correcting the first mask image by applying a coupling filter to the coupling edge.