The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2019
Filed:
Jun. 23, 2017
Samsung Electronics Co., Ltd., Suwon-si, KR;
Moon-Gyu Jeong, Gwangmyeong-si, KR;
SAMSUNG ELECTRONICS CO., LTD., Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do, KR;
Abstract
A mask optimization method for optimizing a target mask used for a partial coherent system including a plurality of spatial filters is provided. The mask optimization method includes obtaining a trainer mask that is an optimized sample mask by performing a mask optimization on a sample mask, generating a mask optimization estimation model by performing a pixel-based learning using, as a feature vector of each of pixels of the trainer mask, partial signals of each of the pixels of the trainer mask respectively determined based on the spatial filters and using, as a target value, a degree of overlap between each of the pixels and a mask polygon of the trainer mask, and performing a mask optimization on the target mask using the mask optimization estimation model.