The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2014
Filed:
Nov. 07, 2012
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, KR;
Inventor:
Moon-Gyu Jeong, Gwangmyeong-si, KR;
Assignee:
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G06F 19/00 (2011.01); G21K 5/00 (2006.01); G03F 1/00 (2012.01); G03F 1/26 (2012.01); G03F 1/38 (2012.01); G03F 1/36 (2012.01); G03F 1/70 (2012.01); G03F 1/72 (2012.01);
U.S. Cl.
CPC ...
G06F 17/5081 (2013.01); G03F 1/26 (2013.01); G03F 1/38 (2013.01); G03F 1/36 (2013.01); G03F 1/70 (2013.01); G03F 1/72 (2013.01); G21K 5/00 (2013.01); G06F 19/00 (2013.01);
Abstract
A method of designing a pattern layout includes defining one shot area including a plurality of chip areas, generating an initial common layout in the plurality of chip areas, primarily correcting the initial layout to form a primary corrected layout, and secondarily correcting the primary corrected layout independently to form a plurality of secondary corrected layouts.