The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2014
Filed:
Aug. 24, 2012
Dmitry Vengertsev, Hwaseong-si, KR;
Seong-ho Moon, Yongin-si, KR;
Artem Shamsuarov, Suwon-si, KR;
Seung-hune Yang, Seoul, KR;
Moon-gyu Jeong, Gwangmyeong-si, KR;
Dmitry Vengertsev, Hwaseong-si, KR;
Seong-Ho Moon, Yongin-si, KR;
Artem Shamsuarov, Suwon-si, KR;
Seung-Hune Yang, Seoul, KR;
Moon-Gyu Jeong, Gwangmyeong-si, KR;
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Abstract
A block management method for OPC model calibration includes calculating differences in several different optical functions between first patterns of a first mask and patterns of a second mask corresponding to the first patterns but differing therefrom by a predetermined bias, selecting one or more of the optical functions based on the calculated differences, clustering data of variations in the values of the calculated differences in the selected ones of the optical functions, selecting respective ones of the first patterns in consideration of how the data clusters, and designating the selected first patterns as test patterns.