Hwaseong-si, South Korea

Dmitry Vengertsev


Average Co-Inventor Count = 4.4

ph-index = 2

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2014-2017

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2 patents (USPTO):Explore Patents

Title: Innovator Spotlight: Dmitry Vengertsev

Introduction: Dmitry Vengertsev is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of optical pattern correction through his innovative methods. With two patents to his name, Vengertsev continues to push the boundaries of technology at Samsung Electronics Co., Ltd.

Latest Patents: Dmitry Vengertsev's recent patents focus on enhancing the accuracy and efficiency of pattern detection and model calibration. The first patent, titled "Method for Detecting Defect in Pattern," presents a novel technique for identifying defects using vectorization. This method involves acquiring a target layout image, extracting an edge image from a pattern formed on a substrate, and comparing vector forms derived from both images. The result is an improved detection process that can significantly enhance optical proximity correction (OPC) modeling and verification.

The second patent, "Test Pattern Selection Method for OPC Model Calibration," addresses the challenges in OPC model calibration. This patent outlines a systematic approach to calculate differences in optical functions between patterns from different masks, selecting key optical functions based on these differences. By clustering variation data and selecting first patterns thoughtfully, this method aims to optimize OPC model accuracy.

Career Highlights: Dmitry's dedication to innovation is evident from his work at Samsung Electronics Co., Ltd., where he has played a crucial role in advancing optical technologies. His two patents not only reflect his technical prowess but also his commitment to improving production processes in the semiconductor industry.

Collaborations: Throughout his career, Vengertsev has collaborated with distinguished colleagues, including Seung-Hune Yang and Seong-Ho Moon, enhancing his work with diverse expertise. Together, they have contributed to the development and refinement of optical pattern correction techniques, adding to the robust intellectual property portfolio at Samsung.

Conclusion: Dmitry Vengertsev stands out as an influential inventor who is shaping the future of optical technologies within the semiconductor industry. His innovative patents demonstrate a blend of creativity and technical skill, solidifying his reputation as a key player in his field. As he continues to excel at Samsung Electronics Co., Ltd., the industry eagerly anticipates his future contributions and breakthroughs.

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