Samsung Electronics Co., Ltd.

Dmitry Vengertsev

Seung-Hune Yang

Ki-Hyun Kim

Moon-Gyu Jeong

Seong-Ho Moon

Artem Shamsuarov

Kai-Yuan Chi

Provided is a method of detecting a defect of a pattern using vectorization to increase accuracy and efficiency in OPC modeling and OPC verification. The method includes acquiring a target layout image associated with a target pattern, acquiring a pattern image associated with a pattern formed on a substrate, extracting an edge image from the pattern image, producing a first vector form based on the target layout image, producing a second vector form based on the edge image, and comparing the first vector form with the second vector form.

Method for detecting defect in pattern

A block management method for OPC model calibration includes calculating differences in several different optical functions between first patterns of a first mask and patterns of a second mask corresponding to the first patterns but differing therefrom by a predetermined bias, selecting one or more of the optical functions based on the calculated differences, clustering data of variations in the values of the calculated differences in the selected ones of the optical functions, selecting respective ones of the first patterns in consideration of how the data clusters, and designating the selected first patterns as test patterns.

Test pattern selection method for OPC model calibration

Growing community of inventors

Hwaseong-si, South Korea

Dmitry Vengertsev