Los Gatos, CA, United States of America

Mohamad A Ayoub

This inventor holds 32 USPTO granted patents and 4 published patent applications, primarily in Plasma Processing. Top assignees: Applied Materials, Inc., Other. Active years: 1999-2024.

USPTO Granted Patents = 32 

% Patents Active = 84.4

Average Co-Inventor Count = 5.2

ph-index = 9

Forward Citations = 557(Granted Patents)


Location History:

  • Freehold, NJ (US) (1999 - 2002)
  • San Jose, CA (US) (2012 - 2016)
  • Las Gatos, CA (US) (2013 - 2019)
  • Los Gatos, CA (US) (2013 - 2024)

Company Filing History:


Years Active: 1999-2024

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Areas of Expertise:
PECVD Process
Plasma Tuning
Shadow Ring
Plasma Source
RF Filter
Closed Loop Control
Impedance Tuning
Plasma Profile
Wafer Edge Deposition
Current-Based Detection
Voltage-Based Detection
Reliability Improvement
32 patents (USPTO):Explore Patents

Title: Mohamad A Ayoub - Pioneering Inventor from Los Gatos, CA

Introduction: Mohamad A Ayoub is a distinguished inventor based in Los Gatos, CA, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Mohamad A Ayoub holds several patents in the areas of artificial intelligence, renewable energy, and medical devices, showcasing his versatility and ingenuity in various domains.

Career Highlights: With a career spanning over two decades, Mohamad A Ayoub has worked with leading tech companies, research institutions, and universities, playing a key role in developing cutting-edge technologies that have revolutionized the industry.

Collaborations: Throughout his career, Mohamad A Ayoub has collaborated with top inventors, patent attorneys, and companies, fostering a culture of innovation and knowledge sharing that has led to numerous successful projects and inventions.

Conclusion: Mohamad A Ayoub's passion for innovation, coupled with his relentless pursuit of excellence, continues to inspire the next generation of inventors and entrepreneurs, making him a true pioneer in the world of technology.

Profile summary based on public USPTO records.
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