The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 2021
Filed:
Nov. 13, 2018
Applied Materials, Inc., Santa Clara, CA (US);
Juan Carlos Rocha-Alvarez, San Carlos, CA (US);
Amit Kumar Bansal, Milpitas, CA (US);
Ganesh Balasubramanian, Fremont, CA (US);
Jianhua Zhou, Campbell, CA (US);
Ramprakash Sankarakrishnan, Santa Clara, CA (US);
Mohamad A. Ayoub, Los Gatos, CA (US);
Jian J. Chen, Fremont, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
An apparatus for plasma processing a substrate is provided. The apparatus comprises a processing chamber, a substrate support disposed in the processing chamber, and a lid assembly coupled to the processing chamber. The lid assembly comprises a conductive gas distributor coupled to a power source. A tuning electrode may be disposed between the conductive gas distributor and the chamber body for adjusting a ground pathway of the plasma. A second tuning electrode may be coupled to the substrate support, and a bias electrode may also be coupled to the substrate support.