Jian J Chen

Title: **Innovations by Jian J Chen: A Pioneer in Substrate Processing**

Introduction

Jian J Chen, based in Fremont, CA, is a notable inventor with an impressive portfolio of 42 patents. His contributions to the field of substrate processing have significantly enhanced manufacturing techniques, particularly in the semiconductor industry.

Latest Patents

Among his latest patents is a **PECVD process** that describes a method for processing a substrate using Plasma Enhanced Chemical Vapor Deposition. This innovative approach involves adjusting the temperature profile of the substrate to control the deposition rate, enhancing uniformity and quality. Additionally, the patent covers the use of in situ metrology to monitor and optimize parameters throughout the deposition process.

Another significant contribution is his work on **methods and apparatus for processing a substrate using improved shield configurations**. This patent details a process kit designed for physical vapor deposition chambers, featuring a uniquely designed shield that employs a combination of wavy fin configurations to maximize surface area and improve deposition efficiency.

Career Highlights

Throughout his career, Jian J Chen has been affiliated with leading companies in the industry, including Applied Materials, Inc. and Lam Research Corporation. His experience in these organizations has cemented his reputation as an expert in substrate processing technologies.

Collaborations

During his tenure, Jian collaborated with talented coworkers, including Mohamad A Ayoub and Juan Carlos Rocha-Alvarez. These partnerships have contributed to the development of innovative solutions and advancements in processing techniques.

Conclusion

Jian J Chen’s contributions to substrate processing through his numerous patents showcase his innovative spirit and dedication to enhancing manufacturing methods. His work continues to influence the semiconductor industry, paving the way for future developments.