The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2020
Filed:
Nov. 24, 2014
Applied Materials, Inc., Santa Clara, CA (US);
Karthik Janakiraman, San Jose, CA (US);
Thomas Nowak, Cupertino, CA (US);
Juan Carlos Rocha-Alvarez, San Carlos, CA (US);
Mark A. Fodor, Los Gatos, CA (US);
Dale R. Du Bois, Los Gatos, CA (US);
Amit Bansal, Milpitas, CA (US);
Mohamad Ayoub, Los Gatos, CA (US);
Eller Y. Juco, San Jose, CA (US);
Visweswaren Sivaramakrishnan, Cupertino, CA (US);
Hichem M'Saad, Santa Clara, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
An apparatus and method are provided for controlling the intensity and distribution of a plasma discharge in a plasma chamber. In one embodiment, a shaped electrode is embedded in a substrate support to provide an electric field with radial and axial components inside the chamber. In another embodiment, the face plate electrode of the showerhead assembly is divided into zones by isolators, enabling different voltages to be applied to the different zones. Additionally, one or more electrodes may be embedded in the chamber side walls.