Osaka, Japan

Moeko Matsubara

USPTO Granted Patents = 2 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2025

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2 patents (USPTO):

Title: Moeko Matsubara: Innovator in Aluminum Nitride Technologies

Introduction

Moeko Matsubara is a prominent inventor based in Osaka, Japan. She has made significant contributions to the field of materials science, particularly in the development of aluminum nitride (AlN) technologies. With a total of two patents to her name, Matsubara's work focuses on improving the manufacturing processes and quality of aluminum nitride materials.

Latest Patents

Matsubara's latest patents include a manufacturing method of modified aluminum nitride raw material and a modified aluminum nitride raw material itself. The purpose of her first patent is to provide a modified AlN source that suppresses downfall defects. This manufacturing method involves a heat treatment step for heat treating an aluminum nitride source and generating an aluminum nitride sintered body. Her second patent addresses the manufacturing method of aluminum nitride crystals and a downfall defect prevention method. This invention aims to remove a strained layer introduced into an aluminum nitride substrate by laser processing. The method involves heat treatment of the aluminum nitride substrate in a nitrogen atmosphere to effectively eliminate the strained layer.

Career Highlights

Throughout her career, Moeko Matsubara has worked with notable organizations such as Kwansei Gakuin Educational Foundation and Toyo Aluminium Kabushiki Kaisha. Her experience in these companies has allowed her to refine her expertise in materials science and patent development.

Collaborations

Matsubara has collaborated with esteemed colleagues, including Tadaaki Kaneko and Daichi Dojima. These partnerships have contributed to her innovative work in the field of aluminum nitride technologies.

Conclusion

Moeko Matsubara is a trailblazer in the development of aluminum nitride materials and manufacturing methods. Her patents reflect her commitment to advancing technology in this area, and her collaborations with other professionals further enhance her contributions to the field.

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