The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 10, 2025

Filed:

Mar. 30, 2021
Applicants:

Kwansei Gakuin Educational Foundation, Hyogo, JP;

Toyo Aluminium Kabushiki Kaisha, Osaka, JP;

Toyota Tsusho Corporation, Aichi, JP;

Inventors:

Tadaaki Kaneko, Sanda, JP;

Daichi Dojima, Sanda, JP;

Moeko Matsubara, Osaka, JP;

Yoshitaka Nishio, Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 33/02 (2006.01); B23K 26/382 (2014.01); B23K 26/402 (2014.01); B23K 103/00 (2006.01); C30B 29/40 (2006.01); C30B 33/04 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C30B 33/02 (2013.01); B23K 26/382 (2015.10); B23K 26/402 (2013.01); C30B 29/403 (2013.01); C30B 33/04 (2013.01); B23K 2103/52 (2018.08); H01L 21/02389 (2013.01); H01L 21/0243 (2013.01);
Abstract

The problem to be solved by the present invention is to provide a novel technique that can remove a strained layer introduced into an aluminum nitride substrate. In order to solve this problem, the present aluminum nitride substrate manufacturing method involves a strained layer removal step for removing a strained layer in an aluminum nitride substrate by heat treatment of the aluminum nitride substrate in a nitrogen atmosphere. In this way, the present invention can remove a strained layer that has been introduced into an aluminum nitride substrate.


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