Nirasaki, Japan

Misako Saito

USPTO Granted Patents = 15 

 

Average Co-Inventor Count = 4.0

ph-index = 5

Forward Citations = 99(Granted Patents)


Location History:

  • Nakakoma-gun, JP (2000 - 2002)
  • Tokyo, JP (2002)
  • Nirasaki, JP (2003 - 2018)
  • Yamanashi, JP (2018)

Company Filing History:


Years Active: 2000-2018

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15 patents (USPTO):Explore Patents

Title: Misako Saito: Innovator in Substrate Cleaning Technologies

Introduction

Misako Saito is a prominent inventor based in Nirasaki, Japan, known for her significant contributions to substrate cleaning technologies. With a total of 15 patents to her name, she has made remarkable advancements in the field of semiconductor manufacturing.

Latest Patents

Among her latest patents are innovative methods and apparatuses for substrate cleaning. One notable patent describes a substrate cleaning method and apparatus that utilizes a cleaning gas containing carbon dioxide. This method involves setting the gas to a pressure slightly lower than the vapor pressure line of carbon dioxide, generating a gas cluster that effectively removes deposits from the backside of a wafer. Another patent focuses on a substrate cleaning method that removes particles adhered to a substrate by controlling the sizes of gas clusters and ejecting the cleaning gas at a higher pressure than the processing atmosphere. This technique ensures high removal rates, even in recesses for circuit patterns.

Career Highlights

Throughout her career, Misako Saito has worked with notable companies such as Tokyo Electron Limited and Taisei Corporation. Her work has significantly impacted the semiconductor industry, particularly in enhancing the efficiency of substrate cleaning processes.

Collaborations

Misako has collaborated with esteemed colleagues, including Teruyuki Hayashi and Sadao Kobayashi, contributing to the advancement of innovative cleaning technologies.

Conclusion

Misako Saito's contributions to substrate cleaning technologies have established her as a leading inventor in her field. Her innovative patents and collaborations continue to influence the semiconductor industry positively.

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