The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 24, 2007
Filed:
Dec. 04, 2001
Shingo Hishiya, Nirasaki, JP;
Yoshikazu Furusawa, Nirasaki, JP;
Teruyuki Hayashi, Nirasaki, JP;
Misako Saito, Nirasaki, JP;
Kota Umezawa, Nirasaki, JP;
Syoichi Sato, Machida, JP;
Shingo Hishiya, Nirasaki, JP;
Yoshikazu Furusawa, Nirasaki, JP;
Teruyuki Hayashi, Nirasaki, JP;
Misako Saito, Nirasaki, JP;
Kota Umezawa, Nirasaki, JP;
Syoichi Sato, Machida, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A thermal treatment apparatusincludes a reaction tubefor containing waferscontaminated with organic substances having a heatercapable of heating the reaction tube; a first gas supply pipefor carrying oxygen gas into the reaction tube; and a second gas supply pipefor carrying hydrogen gas into the reaction tube. Oxygen gas and hydrogen gas are supplied through the first gas supply pipeand the second gas supply pipe, respectively, into the reaction tube, and the heaterheats the reaction tubeat a temperature capable of activating oxygen gas and hydrogen gas. A combustion reaction occurs in the reaction tubeand thereby the organic substances adhering to the wafersare oxidized, decomposed and removed.