Mingni Chang

Title: The Innovative Contributions of Mingni Chang

Introduction

Mingni Chang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 12 patents. His work focuses on advanced methods and structures that enhance the performance and reliability of semiconductor devices.

Latest Patents

Chang's latest patents include innovative methods for forming dummy stacked structures surrounding through-silicon vias (TSVs). One of his notable patents describes a method that involves forming multiple low-k dielectric layers over a semiconductor substrate. This method includes creating a first plurality of dummy stacked structures that extend into these layers, followed by the formation of non-low-k dielectric layers and a second plurality of dummy stacked structures. The process culminates in etching to create a via opening, which is then filled to form a through-via. Another significant patent focuses on passivation layers with rounded corners, detailing a method that enhances the structural integrity of conductive layers on a substrate.

Career Highlights

Mingni Chang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise and innovative approaches have positioned him as a key figure in the development of advanced semiconductor technologies.

Collaborations

Throughout his career, Chang has collaborated with notable colleagues, including Ming-Yih Wang and Yinlung Lu. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Mingni Chang's contributions to semiconductor technology through his patents and collaborative efforts highlight his role as an influential inventor in the industry. His work continues to pave the way for advancements in semiconductor manufacturing and design.