Mingmei Wang

USPTO Granted Patents = 20 (Patent Applications = 11)

Average Co-Inventor Count = 3.5

ph-index = 2

Forward Citations = 32(Granted Patents)

Company Filing History:

20 out of 10,295

Tokyo Electron Limited

where one patent can have more than one assignee

Years Active: 2017-2025

where 'Filed Patents' based on already Granted Patents

20 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 12424447 - Method to selectively etch silicon nitride to silicon oxide using water crystallization (2025-09-23),

2. 12400863 - Method for etching for semiconductor fabrication (2025-08-26),

3. 12308212 - In-situ adsorbate formation for plasma etch process (2025-05-20),

4. 12237172 - Etch process for oxide of alkaline earth metal (2025-02-25),

5. 12131914 - Selective etching with fluorine, oxygen and noble gas containing plasmas (2024-10-29),

6. 12131887 - Plasma processing system and method using radio frequency and microwave power (2024-10-29),

7. 11887815 - Plasma processing system and method using radio frequency (RF) and microwave power (2024-01-30),

8. 11837471 - Methods of patterning small features (2023-12-05),

9. 11804380 - High-throughput dry etching of films containing silicon-oxygen components or silicon-nitrogen components by proton-mediated catalyst formation (2023-10-31),

10. 11538692 - Cyclic plasma etching of carbon-containing materials (2022-12-27),

11. 11232954 - Sidewall protection layer formation for substrate processing (2022-01-25),

12. 11189499 - Atomic layer etch (ALE) of tungsten or other metal layers (2021-11-30),

13. 11158517 - Selective plasma etching of silicon oxide relative to silicon nitride by gas pulsing (2021-10-26),

14. 11152217 - Highly selective silicon oxide/silicon nitride etching by selective boron nitride or aluminum nitride deposition (2021-10-19),

15. 11024508 - Independent control of etching and passivation gas components for highly selective silicon oxide/silicon nitride etching (2021-06-01),

Title: The Innovative Mind of Mingmei Wang: A Pioneer in Plasma Processing Technology

Introduction: Mingmei Wang is a distinguished inventor based in Albany, NY, renowned for his contributions to the field of plasma processing technology. With an impressive portfolio of 17 patents, Wang has made significant strides, particularly in methods of substrate processing that are essential for various applications in semiconductor manufacturing.

Latest Patents: Two of Mingmei Wang's latest patents exemplify his innovative approach to plasma processing. The first patent, titled "Etch Process for Oxide of Alkaline Earth Metal," describes a method for processing a substrate with an oxide of an alkaline earth metal. This process involves loading the substrate into a plasma processing chamber, flowing a process gas, and forming a fluorine-free plasma to effectively etch the oxide on the substrate's surface. His second groundbreaking patent, "Selective Etching with Fluorine, Oxygen, and Noble Gas Containing Plasmas," outlines a cyclic plasma etch process that enhances substrate processing through the generation of dual plasmas for deposition and etching steps.

Career Highlights: Throughout his career, Mingmei Wang has worked with prestigious organizations, including Tokyo Electron Limited and Université D'Orléans. His work in these companies has allowed him to refine his expertise and contribute significantly to advancements in plasma processing technologies.

Collaborations: Mingmei Wang's innovative journey has been marked by collaboration with prominent colleagues, including Du Zhang and Yu-Hao Tsai. This teamwork reflects the collaborative spirit of research and innovation that drives advances in technology and science.

Conclusion: With his impressive array of patents and a solid foundation in plasma processing technology, Mingmei Wang stands out as a leading inventor in his field. His contributions are not only valuable for the companies he has worked for but also play a crucial role in shaping the future of semiconductor technology.

This text is generated by artificial intelligence and may not be accurate.

Please report any incorrect information to support@idiyas.com

11 patents pending:

Please report any incorrect information to support@idiyas.com

Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.