The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2025
Filed:
Sep. 30, 2022
Tokyo Electron Limited, Tokyo, JP;
Du Zhang, Albany, NY (US);
Yu-Hao Tsai, Albany, NY (US);
Masahiko Yokoi, Miyagi, JP;
Yoshihide Kihara, Miyagi, JP;
Mingmei Wang, Albany, NY (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
A method of processing a substrate that includes: flowing dioxygen (O) and an adsorbate precursor into a plasma processing chamber that is configured to hold the substrate including an organic layer and a patterned etch mask; sustaining an oxygen-rich plasma while flowing the Oand the adsorbate precursor, oxygen species from the Oand the adsorbate precursor reacting under the oxygen-rich plasma to form an adsorbate; and exposing the substrate to the oxygen-rich plasma to form a recess in the organic layer, where the adsorbate forms a sidewall passivation layer in the recess.