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For the Inventor, By the Inventor

Kaohsiung, Taiwan

Min Hao Hong

USPTO Granted Patents = 19

Average Co-Inventor Count = 5.0

ph-index = 4

Forward Citations = 37(Granted Patents)


Company Filing History:

goldMedal19 out of 40,635 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 2013-2022

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19 patents (USPTO):
1. 11358252 - Method of using a polishing system (2022-06-14),
2. 10357867 - Polishing system (2019-07-23),
3. 9786707 - Image sensor isolation region and method of forming the same (2017-10-10),
4. 9718164 - Polishing system and polishing method (2017-08-01),
5. 9673244 - Image sensor isolation region and method of forming the same (2017-06-06),
6. 9607946 - Reverse damascene process (2017-03-28),
7. 9536834 - Reverse damascene process (2017-01-03),
8. 9502280 - Two-step shallow trench isolation (STI) process (2016-11-22),
9. 9478581 - Grids in backside illumination image sensor chips and methods for forming the same (2016-10-25),
10. 9368540 - CIS image sensors with epitaxy layers and methods for forming the same (2016-06-14),
11. 9349902 - System and method for reducing irregularities on the surface of a backside illuminated photodiode (2016-05-24),
12. 9257476 - Grids in backside illumination image sensor chips and methods for forming the same (2016-02-09),
13. 9041140 - Grids in backside illumination image sensor chips and methods for forming the same (2015-05-26),
14. 9006070 - Two-step shallow trench isolation (STI) process (2015-04-14),
15. 8889461 - CIS image sensors with epitaxy layers and methods for forming the same (2014-11-18),

Title: Innovations of Min Hao Hong: Advancements in Polishing Systems

Introduction: Min Hao Hong is an accomplished inventor based in Kaohsiung, Taiwan. With an impressive portfolio of 19 patents, he has significantly contributed to the field of semiconductor manufacturing. His recent innovations focus on enhancing polishing techniques, which are crucial for the fabrication of high-quality wafers.

Latest Patents: Among Min Hao Hong's latest patents is a method of using a polishing system. This innovative method includes several steps: securing a wafer to a support, polishing the wafer with a first polishing pad, and subsequently using a second polishing pad after rotating the support. The first polishing pad has a diameter greater than that of the wafer, while the second polishing pad has a smaller diameter, ensuring precise polishing of the wafer’s surface. Additionally, he developed a complete polishing system that incorporates a wafer support and an auxiliary polishing system, with specific pad sizes designed for optimal efficiency.

Career Highlights: Min Hao Hong's illustrious career is marked by his dedication to improving semiconductor processes. Working at Taiwan Semiconductor Manufacturing Company Limited, he plays a vital role in advancing technology that underpins modern electronics. His extensive research and application of polishing systems have helped refine the manufacturing processes in the semiconductor industry.

Collaborations: Throughout his career, Min Hao Hong has collaborated with esteemed colleagues such as Shiu-Ko JangJian and You-Hua Chou. These partnerships have fostered a collaborative environment that promotes innovation and advancement in their technical fields, enhancing overall productivity and innovation.

Conclusion: Min Hao Hong remains a prominent figure in semiconductor technology, with his latest patents showcasing his commitment to innovation in polishing systems. His work continues to influence the industry positively, reflecting his expertise and dedication to advancing manufacturing processes. As technologies evolve, inventors like Min Hao Hong are essential in pushing the boundaries of what is possible in semiconductor fabrication.

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