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For the Inventor, By the Inventor

Kikuchi, Japan

Michio Tanaka

This inventor holds 12 USPTO granted patents. Top assignee: Tokyo Electron Limited. Active years: 2004-2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Michio Tanaka. Retrieved from https://idiyas.com/inventor/michio-tanaka-od3wvq0t

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 12

% Patents Active = 33.3

Average Co-Inventor Count = 3.6

ph-index = 4

Forward Citations = 50(Granted Patents)


Location History:

  • Kumamoto-Ken, JP (2006)
  • Kumamoto, JP (2005 - 2008)
  • Koshi, JP (2008 - 2010)
  • Cupertino, CA (US) (2011)
  • Kikuchi-gun, JP (2004 - 2012)

Company Filing History:

goldMedal12 out of 10,947 
 
Tokyo Electron Limited
 patents

Years Active: 2004-2012

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12 patents (USPTO):Explore Patents
1. 8231285 - Substrate processing method and apparatus (2012-07-31),
2. 7867674 - Substrate-processing apparatus, substrate-processing method, substrate-processing program, and computer-readable recording medium recorded with such program (2011-01-11),
3. 7867673 - Substrate-processing apparatus, substrate-processing method, substrate-processing program, and computer-readable recording medium recorded with such program (2011-01-11),
4. 7862966 - Substrate-processing apparatus, substrate-processing method, substrate-processing program, and computer-readable recording medium recorded with such program (2011-01-04),
5. 7780366 - Resist pattern forming method (2010-08-24),
6. 7643126 - Method of setting focus condition at time of exposure, apparatus for setting focus condition at time of exposure, program, and computer readable recording medium (2010-01-05),
7. 7488127 - Resist pattern forming apparatus and method thereof (2009-02-10),
8. 7420650 - Method of setting processing condition in photolithography process, apparatus for setting processing condition in photolithography process, program, and computer readable recording medium (2008-09-02),
9. 7375831 - Line width measuring method, substrate processing method, substrate processing apparatus and substrate cooling processing unit (2008-05-20),
10. 6984477 - Resist pattern forming apparatus and method thereof (2006-01-10),
11. 6974963 - Substrate inspecting device, coating/developing device and substrate inspecting method (2005-12-13),
12. 6766209 - Managing system, managing method, host computer, and information collecting/transmitting unit (2004-07-20),

Title: Michio Tanaka: Innovator in Substrate Processing Technology

Introduction

Michio Tanaka is a prominent inventor based in Kikuchi-gun, Japan. He has made significant contributions to the field of substrate processing, holding a total of 12 patents. His work focuses on improving the efficiency and accuracy of resist pattern formation and substrate processing methods.

Latest Patents

Tanaka's latest patents include a substrate processing method and apparatus that enhances the resist pattern forming process. This innovative method utilizes a coating and developing apparatus, along with an aligner, to create a resist film on a substrate with a base film and pattern. The system inspects various measurement items, such as reflection ratio, film thickness, and line width, to ensure quality and accuracy. Additionally, he has developed a substrate-processing apparatus that includes a checking apparatus, storage device, and control section. This system measures the state of the resist pattern after development and the pattern after etching, using a correlation formula to optimize the processing conditions.

Career Highlights

Tanaka is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work has significantly impacted the efficiency of substrate processing, making it easier for operators to achieve precise results.

Collaborations

Throughout his career, Tanaka has collaborated with notable colleagues, including Kunie Ogata and Hiroshi Tomita. These partnerships have contributed to the advancement of technology in substrate processing.

Conclusion

Michio Tanaka's innovative work in substrate processing technology has led to numerous patents and advancements in the field. His contributions continue to influence the industry and improve manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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