The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 11, 2011
Filed:
Sep. 13, 2006
Michio Tanaka, Cupertino, CA (US);
Shinichi Shinozuka, Kumamoto, JP;
Masahide Tadokoro, Kumamoto, JP;
Kunie Ogata, Kumamoto, JP;
Hiroshi Tomita, Kumamoto, JP;
Ryoichi Uemura, Kumamoto, JP;
Michio Tanaka, Cupertino, CA (US);
Shinichi Shinozuka, Kumamoto, JP;
Masahide Tadokoro, Kumamoto, JP;
Kunie Ogata, Kumamoto, JP;
Hiroshi Tomita, Kumamoto, JP;
Ryoichi Uemura, Kumamoto, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A pattern forming systemincludes a checking apparatusand a control section. The checking apparatusis configured to measure and check a sidewall angle SWA of a resist pattern formed on a substrate W after a developing process. The control sectionis configured to use a difference between a target value of the sidewall angle SWA of the resist pattern after the developing process and a check result of the sidewall angle SWA obtained by the checking apparatus, to set a process condition for a first heat processtoor a second heat processtoso as to cause the sidewall angle SWA to approximate the target value thereof after the developing process.