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For the Inventor, By the Inventor

Koshi, Japan

Kunie Ogata

USPTO Granted Patents = 36

Average Co-Inventor Count = 2.7

ph-index = 13

Forward Citations = 418(Granted Patents)


Location History:

  • Yokohama, JP (1998 - 2001)
  • Kanagawa-Ken, JP (2001)
  • Tokyo-To, JP (2002)
  • Kumamoto-Ken, JP (2006)
  • Kikuchi-Gen, JP (2009)
  • Kumamoto, JP (2001 - 2011)
  • Kikuchi-Gun, JP (2003 - 2012)
  • Koshi, JP (2011 - 2014)

Company Filing History:

goldMedal36 out of 10,295 
 
Tokyo Electron Limited
 patents

Years Active: 1998-2014

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36 patents (USPTO):Explore Patents
1. 8916229 - Substrate processing method (2014-12-23),
2. 8885140 - Substrate treatment apparatus, substrate treatment method and non-transitory storage medium (2014-11-11),
3. 8308381 - Substrate processing method, computer-readable storage medium, and substrate processing system (2012-11-13),
4. 8253077 - Substrate processing method, computer-readable storage medium and substrate processing system (2012-08-28),
5. 8231285 - Substrate processing method and apparatus (2012-07-31),
6. 8135487 - Temperature setting method and apparatus for a thermal processing plate (2012-03-13),
7. 8041525 - Substrate measuring method, computer-readable recording medium recording program thereon, and substrate measuring system (2011-10-18),
8. 7985516 - Substrate processing method, computer-readable storage medium and substrate processing system (2011-07-26),
9. 7968825 - Temperature setting method of thermal processing plate, computer-readable recording medium recording program thereon, and temperature setting apparatus for thermal processing plate (2011-06-28),
10. 7968260 - Substrate processing method, computer-readable storage medium, and substrate processing system (2011-06-28),
11. 7957828 - Temperature setting method for thermal processing plate, temperature setting apparatus for thermal processing plate, and computer-readable storage medium (2011-06-07),
12. 7897896 - Temperature setting method of thermal processing plate, computer-readable recording medium recording program thereon, and temperature setting apparatus for thermal processing plate (2011-03-01),
13. 7884950 - Substrate processing method, program, computer-readable storage medium, and substrate processing system (2011-02-08),
14. 7867674 - Substrate-processing apparatus, substrate-processing method, substrate-processing program, and computer-readable recording medium recorded with such program (2011-01-11),
15. 7867673 - Substrate-processing apparatus, substrate-processing method, substrate-processing program, and computer-readable recording medium recorded with such program (2011-01-11),

Title: **Kunie Ogata: Innovator in Substrate Processing Technology**

Introduction: Kunie Ogata, located in Koshi, Japan, is a prominent inventor with a remarkable portfolio of 36 patents. His contributions to substrate processing technology have significantly advanced the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents: Among his notable recent inventions is a substrate processing apparatus designed to optimize the transportation of wafers within a production module. This innovative method allows for rapid transfer of substrates, sequentially transporting them through multiple unit blocks by adhering to a specific providing sequence. Furthermore, Ogata has developed a substrate treatment apparatus that employs solution treatment for substrates, featuring a sophisticated monitoring section that ensures the integrity of the treatment process. This system enables the identification and control of nozzles to mitigate treatment failures, exemplifying his commitment to enhancing reliability in substrate processing.

Career Highlights: Kunie Ogata's career is marked by his pivotal role at Tokyo Electron Limited, a leading company in semiconductor production equipment. His relentless pursuit of innovation has propelled the company forward, reinforcing its position in the technology sector. Through his extensive patent work, Ogata has demonstrated a profound understanding of industry challenges and has consistently delivered solutions that streamline operations.

Collaborations: Throughout his career, Ogata has collaborated with esteemed colleagues, including Shinichi Shinozuka and Hiroshi Tomita. Their collective expertise has fostered an environment of innovation and creativity, allowing for the development of groundbreaking technologies within the semiconductor field.

Conclusion: Kunie Ogata's contributions to substrate processing are noteworthy and continue to impact the semiconductor industry significantly. With a strong foundation of patents and collaborative efforts, he stands as a key figure in the ongoing journey of innovation within technology. His work not only enhances operational efficiencies but also paves the way for future advancements in substrate treatment and processing methodologies.

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