The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2014
Filed:
Aug. 30, 2012
Tomohiro Nakashima, Koshi, JP;
Shin Inoue, Dresden, DE;
Yoshitaka Hara, Koshi, JP;
Izumi Hasegawa, Koshi, JP;
Kunie Ogata, Koshi, JP;
Takuya Mori, Tokyo, JP;
Tomohiro Nakashima, Koshi, JP;
Shin Inoue, Dresden, DE;
Yoshitaka Hara, Koshi, JP;
Izumi Hasegawa, Koshi, JP;
Kunie Ogata, Koshi, JP;
Takuya Mori, Tokyo, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
The present invention is a substrate treatment apparatus for performing solution treatment on a substrate, performing post-treatment in a treatment module subsequent to the solution treatment, including: a solution treatment section including a plurality of nozzles prepared for respective kinds of treatment solutions corresponding to lots of substrates; a transfer mechanism for transferring the substrate; a monitoring section monitoring whether there is a failure in discharge of the treatment solution in the nozzle; and a control unit outputting a control signal to prohibit the solution treatment in the solution treatment section for a substrate scheduled to be treated using a nozzle determined to have a failure by the monitoring section and to perform the solution treatment in the solution treatment section for a substrate scheduled to be treated using a nozzle other than the nozzle determined to have a failure.