Location History:
- Dresden, DE (2014)
- Koshi, JP (2023)
Company Filing History:
Years Active: 2014-2023
Title: Innovations by Shin Inoue
Introduction
Shin Inoue is a notable inventor based in Dresden, Germany. He has made significant contributions to the field of substrate treatment technology. With a focus on improving inspection methods and treatment apparatus, Inoue has been awarded 2 patents for his innovative work.
Latest Patents
Inoue's latest patents include a substrate defect inspection method, storage medium, and substrate defect inspection apparatus. This invention inspects defects of substrates during predetermined treatments. The process involves an imaging step that captures images of the substrates. A first determination step utilizes a Zernike polynomial to analyze pixel values in the substrate image. It calculates Zernike coefficients to detect defects and determines their presence or absence. A second determination step further assesses the substrate image to confirm the absence of defects based on prior evaluations.
Another significant patent is a substrate treatment apparatus designed for solution treatment on substrates. This apparatus includes a solution treatment section with multiple nozzles for different treatment solutions. It features a transfer mechanism for substrate movement and a monitoring section to detect failures in the discharge of treatment solutions. The control unit ensures that treatment is only performed using functional nozzles, enhancing the reliability of the treatment process.
Career Highlights
Shin Inoue is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics industry. His work focuses on developing advanced technologies that improve substrate treatment processes. Inoue's innovative solutions have the potential to enhance manufacturing efficiency and product quality.
Collaborations
Inoue collaborates with talented coworkers, including Kazuya Hisano and Akiko Kiyotomi. Their combined expertise contributes to the advancement of substrate treatment technologies.
Conclusion
Shin Inoue's contributions to substrate treatment technology through his patents demonstrate his commitment to innovation. His work not only addresses current challenges in the industry but also paves the way for future advancements.