The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 13, 2012
Filed:
Apr. 15, 2008
Megumi Jyousaka, Koshi, JP;
Masahide Tadokoro, Koshi, JP;
Yoshitaka Konishi, Koshi, JP;
Shinichi Shinozuka, Koshi, JP;
Kunie Ogata, Koshi, JP;
Megumi Jyousaka, Koshi, JP;
Masahide Tadokoro, Koshi, JP;
Yoshitaka Konishi, Koshi, JP;
Shinichi Shinozuka, Koshi, JP;
Kunie Ogata, Koshi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A temperature setting method of the present invention includes the steps of: measuring states of an etching pattern within the substrate for a substrate for which a series of photolithography processing including thermal processing and an etching treatment thereafter have been finished; calculating temperature correction values for regions of a thermal processing plate from measurement result of the states of the etching pattern within the substrate using a function between correction amounts for the states of the etching pattern and the temperature correction values for the thermal processing plate; and setting the temperature for each of the regions of the thermal processing plate by each of the calculated temperature correction values.