The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 11, 2011
Filed:
Sep. 13, 2006
Kunie Ogata, Kumamoto, JP;
Hiroshi Tomita, Kumamoto, JP;
Michio Tanaka, Cupertino, CA (US);
Ryoichi Uemura, Kumamoto, JP;
Kunie Ogata, Kumamoto, JP;
Hiroshi Tomita, Kumamoto, JP;
Michio Tanaka, Cupertino, CA (US);
Ryoichi Uemura, Kumamoto, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A pattern forming systemincludes a checking apparatus, a storage device, and a control section. The checking apparatusis configured to measure and check a state of a resist pattern formed on a substrate W after a developing process and output a first check result thus obtained, and to measure and check a state of a pattern formed on the substrate after an etching process and output a second check result thus obtained. The storage devicestores a correlation formula obtained from the first check result and the second check result. The control sectionis configured to use the correlation formula to obtain a target value of the state of the pattern after the developing process from a target value of the state of the pattern after the etching process, and to use a difference between the target value of the state of the pattern after the developing process and the first check result to set a condition for the first heat process and/or the second heat process.