The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 04, 2011
Filed:
Sep. 13, 2006
Kunie Ogata, Kumamoto, JP;
Hiroshi Tomita, Kumamoto, JP;
Michio Tanaka, Cupertino, CA (US);
Ryoichi Uemura, Kumamoto, JP;
Kunie Ogata, Kumamoto, JP;
Hiroshi Tomita, Kumamoto, JP;
Michio Tanaka, Cupertino, CA (US);
Ryoichi Uemura, Kumamoto, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A pattern forming systemis configured to execute a series of processes, which includes a first heat process for performing a heat process on a substrate W after a resist liquid coating process, a light exposure process for performing light exposure on a resist film in accordance with a predetermined pattern, a second heat process for promoting a chemical reaction in the resist film after the light exposure, a developing process for developing the resist film after the light exposure, and an etching process for etching an oxide film by use of a resist pattern formed by the developing process as a mask. The system includes a checking apparatusconfigured to measure and check a state of a pattern formed after the etching process, and a control sectionconfigured to use a check result to set a condition for the first heat process and/or the second heat process so as to cause the state of the pattern to be uniform on a surface of the substrate W after the etching process.