Location History:
- Hitachinaka, JP (2003 - 2016)
- Kanagawa, JP (2016 - 2018)
Company Filing History:
Years Active: 2003-2018
Title: Michimoto Kaminaga: Innovator in Semiconductor Technology
Introduction
Michimoto Kaminaga is a prominent inventor based in Hitachinaka, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 14 patents. His work focuses on enhancing the reliability and efficiency of semiconductor devices.
Latest Patents
One of Kaminaga's latest patents is a semiconductor device and method for manufacturing the same. This innovation features a gate electrode for a trench-gate field effect transistor, which is formed through a gate insulating film in a trench made in a semiconductor substrate. The design ensures that the upper surface of the gate electrode is positioned lower than the upper surface of the semiconductor substrate in areas adjacent to the trench. Additionally, a sidewall insulating film is formed over the gate electrode and the sidewall of the trench. The gate electrode and the sidewall insulating film are then covered by an insulating film, serving as an interlayer insulating film. This design enhances the reliability of the semiconductor device.
Career Highlights
Kaminaga has worked with notable companies in the semiconductor industry, including Renesas Electronics Corporation and Renesas Technology Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas in semiconductor technology.
Collaborations
Throughout his career, Kaminaga has collaborated with talented individuals such as Hiroyuki Uchiyama and Hiraku Chakihara. These collaborations have contributed to the advancement of his projects and innovations.
Conclusion
Michimoto Kaminaga is a key figure in the semiconductor industry, known for his innovative patents and contributions to technology. His work continues to influence the development of reliable semiconductor devices, showcasing his commitment to advancing the field.