The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 22, 2012
Filed:
Apr. 09, 2010
Hiroyuki Uchiyama, Tachikawa, JP;
Hiraku Chakihara, Akishima, JP;
Teruhisa Ichise, Ome, JP;
Michimoto Kaminaga, Hitachinaka, JP;
Hiroyuki Uchiyama, Tachikawa, JP;
Hiraku Chakihara, Akishima, JP;
Teruhisa Ichise, Ome, JP;
Michimoto Kaminaga, Hitachinaka, JP;
Renesas Electronics Corporation, Kanagawa, JP;
Abstract
A semiconductor IC includes grooves formed in a substrate to define a first dummy region and second dummy regions formed at a scribing area, and third dummy regions and a fourth dummy region formed at a product area. A width of the first dummy region is greater than widths of each of the second and third dummy regions and a width of the fourth dummy region is greater than widths of each of the third dummy regions. A conductor pattern is formed over the first dummy region for optical pattern recognition. The first dummy region is formed under the conductor pattern so the grooves are not formed under the conductor pattern. The second dummy regions are spaced from one another by a predetermined spacing at the scribing area, and the third dummy regions are spaced from one another by a predetermined spacing at the product area.