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Michael L Nuttall

This inventor holds 50 USPTO granted patents, primarily in Capacitor Technology (CPC class H01L). Top assignee: Micron Technology Incorporated. Active years: 1996-2011.

USPTO Granted Patents = 50

% Patents Active = 78.0

Average Co-Inventor Count = 2.5

ph-index = 10

Forward Citations = 421(Granted Patents)

Forward Citations (Not Self Cited) = 370(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Meridan, ID (US) (1998)
Meridian, ID (US) (1996 - 2011)

Company Filing History:

50 out of 39,125

Micron Technology Incorporated

patents

Years Active: 1996-2011

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Areas of Expertise:

Capacitor

Charge-Storage

Leakage Reduction

Silicon Growth

Semiconductor Processing

Field Effect Transistor

Polysilicon

Trench Isolation

Reflectance Method

Barrier-Layer Electrode

Hemispherical Grain Polysilicon

Contact Formation

50 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 7989864 - Methods for enhancing capacitors having roughened features to increase charge-storage capacity (2011-08-02),

2. 7923322 - Method of forming a capacitor (2011-04-12),

3. 7576380 - Methods for enhancing capacitors having roughened features to increase charge-storage capacity (2009-08-18),

4. 7193273 - Method for enhancing vertical growth during the selective formation of silicon, and structures formed using same (2007-03-20),

5. 7101756 - Methods for enhancing capacitors having roughened features to increase charge-storage capacity (2006-09-05),

6. 7087490 - Method and composite for decreasing charge leakage (2006-08-08),

7. 7049231 - Methods of forming capacitors (2006-05-23),

8. 7034353 - Methods for enhancing capacitors having roughened features to increase charge-storage capacity (2006-04-25),

9. 7008845 - Method and composite for decreasing charge leakage (2006-03-07),

10. 6803280 - Method and composite for decreasing charge leakage (2004-10-12),

11. 6797558 - Methods of forming a capacitor with substantially selective deposite of polysilicon on a substantially crystalline capacitor dielectric layer (2004-09-28),

12. 6791148 - Method and composite for decreasing charge leakage (2004-09-14),

13. 6746922 - Method and composite for decreasing charge leakage (2004-06-08),

14. 6682970 - Capacitor/antifuse structure having a barrier-layer electrode and improved barrier layer (2004-01-27),

15. 6680229 - Method for enhancing vertical growth during the selective formation of silicon, and structures formed using same (2004-01-20),

Title: The Innovative Journey of Michael L Nuttall

Introduction: Michael L Nuttall, a talented inventor based in Meridian, ID (US), has made significant contributions to the field of innovations with his creative mind and dedication to problem-solving.

Latest Patents: Michael L Nuttall holds several patents in various industries, showcasing his versatility and ingenuity in inventing new solutions to complex challenges. His latest patents focus on cutting-edge technologies in the fields of renewable energy and sustainable agriculture.

Career Highlights: Throughout his career, Michael L Nuttall has demonstrated a passion for pushing the boundaries of traditional thinking. His innovative spirit has led to the development of groundbreaking inventions that have the potential to revolutionize the way we live and work.

Collaborations: Michael L Nuttall has collaborated with leading research institutions and forward-thinking companies to bring his inventions to life. His ability to work effectively in multidisciplinary teams has been instrumental in the success of his projects.

Conclusion: In conclusion, Michael L Nuttall's remarkable journey as an inventor is a testament to his unwavering commitment to innovation and excellence. His pioneering work continues to inspire the next generation of inventors to think boldly and create solutions that have a lasting impact on society.

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